| 摘要 |
PURPOSE:To execute single-exposure of a common electrode, to reduce the common transition number to half, and to expand a display area, by using a low resistance interference area spatter ITO film, as an electrode. CONSTITUTION:An interference area IT film (about 1,500-1,800Angstrom ) formed on a glass substrate 12 by spattering is converted to an electrode pattern by etching, and subsequently, is converted to an ITO film for securing transmittivity of >=83% by burning at 400-500 deg.C. In this case, surface resistance becomes 20- 50OMEGA/sq. It is constituted of a cell structure (a common electrode 1, a segment electrode 2, a polarizing plate 11 and a glass substrate 12). Also, as for an interference color of the ITO film, color shading is prevented by a colored polarizing plate having the same optical characteristic as that of this film in the visible area. |
