PHOTO- AND ELECTRON RESIST

摘要

The photo- and electron resist contains a light-sensitive compound, a film-forming compound, a sensitizer, an organic solvent, an additive which forms a donor-acceptor complex with said compounds and reaction products thereof, which complex quenches the luminescence and improves the stability of the resist. The photo- and electron resist finds application in microelectronics, optics, printing arts, precise mechanical engineering, where structures of semiconductor devices and solid-state circuit are fabricated through the use of the resists.