发明名称 PHOTOENGRAVING METHOD FOR SCREEN MASK
摘要 PURPOSE:To make patterns of partially different thicknesses printable with respect to a screen mask for the purpose of printing patterns on a substrate for hybrid ICs, etc. by forming patterns of plural kinds differing in thickness of emulsion film on the same mesh. CONSTITUTION:A photosensitive emulsion 11 is coated to prescribed thickness on a screen mesh 10, and an art work film 12 is placed thereon and is exposed then developed, whereby parts 13 for forming patterns are formed. Thereafter, the 2nd photosensitive emulsion 14 is coated over the entire surface at the thickness differing from the thickness of the previous photosensitive emulsion 11 and is exposed and developed by using an art work film differing in patterns from the film used before, whereby parts 15 for forming patterns differing in thickness are formed. If the screen mask 16 formed in the above-mentioned method is used in printing, patterns 13a are formed thickly and patterns 15a thinly on a substrate 19.
申请公布号 JPS58114039(A) 申请公布日期 1983.07.07
申请号 JP19810209774 申请日期 1981.12.28
申请人 FUJITSU KK 发明人 KIMURA YUUJI
分类号 G03F7/12;(IPC1-7):03F7/12 主分类号 G03F7/12
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