| 摘要 |
PURPOSE:To obtain high sensitivity characteristics and to enable development with aq. soln., by using a compsn. consisting of a polymer having phenolic hydroxyl groups on the side chains and an azide cross-linking agent as a positive type electron beam resist. CONSTITUTION:A resist layer is formed by coating a base with a compsn. consisting of a polymer contg. repeating units represented by general formulaI, and a compd. having >=2 azide groups as a cross-linking agent. The resist layer is heated or heated and irradiated with UV rays to cross-link the resist, and then it is exposed to electron beams or the like. The parts irradiated with the beams are decomposed on the main chain or the cross-linking chains, and made soluble in water. Since said polymer is hydroxyl groups, an aq. alkaline soln. is used for development. Since the unexposed parts have cross-linked structure, sensitization development is made possible, sensitivity and resolution are raised without causing swelling. |
