| 摘要 |
PURPOSE:To obtain a spattering device which has reduced remaining gas density of a discharge area and has elevated a film quality of a thin film, by providing a discharging gas release port in the vicinity of the discharge area between a target and a substrate. CONSTITUTION:In the vicinity of a discharge area between a target 8 and a substrate 3-1, which have been placed in a vacuum tank 1, a discharging gas release port into the vacuum tank 1 is provided. For instance, an air-gap between a target cathode 2-1 and an earth cover 2-2 is used as the discharging gas release port. According to this structure, residual gas discharged from a shutter 4, a vacuum tank wall and a substrate electrode 3 does not go into the discharge area but is discharged quickly from an exhaust port 7 by a vacuum pump, and a film quality of a thin film is elevated. |
