Composition for depositing metallic oxide film coatings

摘要

An organic solution of a composition consisting essentially of 100 parts of an indium compound represented by the formula In(X)l(Y)m wherein X denotes a chelate ring formed by beta -diketones, esters of beta -ketoacids or the like, Y denotes an alkoxide formed by aliphatic alcohols or the like, and l and m denote an integer which is either 1 or 2 having the relationship of l+m=3, and from 5 to 20 parts of a tin compound represented by the formula Sn(X')2 or Sn(Y')m' wherein X' denotes a chelate ring formed by beta -diketones or esters of beta -ketoacids, Y' denotes an alkoxide formed by aliphatic alcohols, and m' denotes 2 or 4, is suitable for deposition of transparent, hardened and low resistivity film coatings of tin-doped indium oxide on a substrate by dipcoating.