发明名称 |
Photometer having asymmetrical aperture and with compensation for direction of incidence |
摘要 |
A photometer having asymmetrical apertures and with compensation for direction of incidence includes a photodetector, a mask having asymmetrical apertures and arranged before the photodetector and a compensation prism arranged either before or after the mask. The photometer is adapted to compensate for the difference in quantity of light incident on the photodetector caused by the mask depending on the difference in the direction of incidence of the light.
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申请公布号 |
US4391521(A) |
申请公布日期 |
1983.07.05 |
申请号 |
US19800188146 |
申请日期 |
1980.09.17 |
申请人 |
OLYMPUS OPTICAL CO., LTD. |
发明人 |
IMAI, TOSHIHIRO;YAMADA, TOYOTAKA |
分类号 |
G03B7/099;G01J1/04;G02B5/02;(IPC1-7):G01J1/04 |
主分类号 |
G03B7/099 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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