| 摘要 |
PURPOSE:To reduce a time necessary for registering without moving a photomask used for an integrated circuit patterning step, by providing a registering mark used during the step at the outside frame of a pair of registering marks. CONSTITUTION:Grid lines 2, 3 in the directions of the X-axis and the Y-axis for dividing the region of a chip, the first registering mark 4 of a mark on a silicon wafer, and a second registering mark 11 for forming an outside frame surrounding the region of the mark 4 are provided on the surface of a transparent glass base 1 with an opaque material with respect to a light used for exposure of a photoresist film. A photomask having a mark 10 used in the preceding step, and a mark 12 to be used in the next step are used for registering. The photomask is placed on the chip obtained by laminating the silicon wafer 13, an insulating layer 14, and the photoresist film 15, and registering operations of exposure and etching are executed without moving them, thus permitting a necessary time for registering one sheet of wafer in a microscopic field of vision to be reduced by use of this mask. |
