发明名称 SPUTTER FILMING DEVICE
摘要 PURPOSE:To detect the film thickness and resist film quality formed on a substrate by a method wherein a detector revolving together with substrate is provided on a substrate holder. CONSTITUTION:The lower edge of a substrate holder 13 is formed into a notch 13a wherein a rock crystal oscillator 16 and resistance measuring device 18 are supported by the substrate holder 13 so that they may be leveled with the height of substrate film surface. Said measuring device 18 comprises electrodes 20 formed on insulated substrate 19 at specified interval and each electrode 20 is connected to conductive wire 21. Both conductive wires 17, 21 of the rock crystal oscillator 16 and the resistace measuring device 18 are connected to a measuring device arranged outside the cavity 1 through the axle core of an axle 12. The substrate, rock crystal oscillator 16 and resistance measuring device 18 supported by the substrate holder 13 revolve as one body respectively forming thin films with the same thickness. Therefore the film thickness may be correctly detected by the fluctuation of the output of said rock crystal oscillator.
申请公布号 JPS58108747(A) 申请公布日期 1983.06.28
申请号 JP19810206892 申请日期 1981.12.23
申请人 HITACHI SEISAKUSHO KK 发明人 FUJIMOTO KAZUYUKI;KAWAIRI MICHIYOSHI
分类号 C23C14/54;H01L21/203;H01L21/31 主分类号 C23C14/54
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