发明名称 POLISHING MEMBER FOR WORKING
摘要 PURPOSE:To prevent the destruction of the groove form or the metallic film to be coated, by coating the 1st hard metallic film and the 2nd soft metallic film on a polishing base and burying fixedly the fine powder abrasive grains into the 2nd soft metallic film. CONSTITUTION:A polishing board 50 is made by forming the 1st hard metallic film 23 and then the 2nd soft metallic film 25 on a polishing base 23 having a groove 300 and furthermore burying the fine powder abrasive grains 26 into the film 25. The polyvinyl chloride is used to the material of the base 23, and the film 24 is formed with Ti, Cr, etc. While the film 25 into which the grains 6 of diamond, SiO2, Al2O3, etc. are buried is formed with Cu, Sn, etc. In this case, Ta>Tm>=1/2 Ta is satisfied, where Tm shows the thickness of the film 25 and Ta is the size of the abrasive 26. IF Ta is smaller than Tm, the grains 26 are excessively buried to obtain no proper projections of the grains 26 over the film surface. On the contrary, if Ta is larger double than Tm, the number of projections of the grains 26 increases to make it hard to fix the grains 26.
申请公布号 JPS58105405(A) 申请公布日期 1983.06.23
申请号 JP19810201527 申请日期 1981.12.16
申请人 TOKYO SHIBAURA DENKI KK 发明人 KONUKI AKIO;FUJIOKA YOSHIHARU;TAKEI SHIYUUJI
分类号 B24B19/16;G11B3/56;G11B9/07 主分类号 B24B19/16
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