发明名称 Plasma monitor.
摘要 <p>Disclosed is a plasma monitor which measures the distribution of particular chemical species (atom, molecule, ion) in plasma generated inside an instrument making use of the plasma. Laser light having a particular wavelength is radiated to the particular chemical species so as to let it generate fluorescence. The fluorescence is picked up for each of a plurality of zones divided in the radiating direction of the laser light and the concentration of the chemical species in each zone is determined on the basis of the intensity of the fluorescence in each zone in order to determine the concentration distribution of the particular chemical species contained in the plasma. The operative condition within the sealed vessel can be grasped more accurately by measuring the distribution of the concentration of the chemical species which is closely related with the condition of deposition or etching.</p>
申请公布号 EP0081785(A2) 申请公布日期 1983.06.22
申请号 EP19820111261 申请日期 1982.12.06
申请人 HITACHI, LTD. 发明人 OSADA, HISAJIRO;HIRATSUKA, YUTAKA
分类号 C23C14/54;G01N21/27;G01N21/64;H05H1/00;(IPC1-7):01N21/64;05H1/00 主分类号 C23C14/54
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