发明名称 Method of manufacturing pn junction in group II-VI compound semiconductor
摘要 A method of manufacturing a pn junction in a substantially n-type ZnSe compound semiconductor crystal grown by relying on a liquid growth method using temperature difference technique, by diffusing therein gold which is a p-type impurity or by forming therein a gold alloy in an inert gas atmosphere. This impurity has such a high diffusion velocity as can suppress the vaporization, from ZnSe crystal, of Se atoms having a vaporization speed lower than the diffusion speed of gold, and thus desired pn junction can be formed.
申请公布号 US4389256(A) 申请公布日期 1983.06.21
申请号 US19810270816 申请日期 1981.06.05
申请人 NISHIZAWA, JUN-ICHI 发明人 NISHIZAWA, JUN-ICHI;ITO, KAZUOMI
分类号 C30B31/02;H01L21/368;H01L21/383;H01L21/385;H01L21/40;H01L29/227;H01L33/28;H01L33/40;(IPC1-7):H01L21/32 主分类号 C30B31/02
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