| 摘要 |
PURPOSE:To obtain excellent adhesion between a mask and a sample substrate, stable solar battery characteristics, and a superior external appearance, by introducing a specified gas in a vacuum chamber, obtaining a specified internal pressure, and performing a plasma CVD method in which a glow discharge is generated, in the formation of an amorphous silicon film. CONSTITUTION:With air being evacuated through an exhausting port 13 so as to obtain a vacuum state, a monosilane gas is introduced by a mass flow controller 4, and the internal pressure is made to be 0.1-5 Torr. Thereafter, a power is supplied from a high frequency power source 11. Then the glow discharge is generated between an electrode 8 and a susceptor 9, plasma is generated, the monosilane is decomposed, and the amorphous silicon film is formed on the surface of the sample substrate 12. When impurities are doped in the amorphous silicon film, phosphine or diborane is concurrently flowed together with the monosilane gas by the mass flow controller 5 or 6. In the former case, the N type amorphous silicon film is formed. In the latter case, the P type amorphous silicon film is formed. |
