发明名称 FORMATION OF WAVEGUIDE
摘要 PURPOSE:To permit accurate controlling of element characteristics and to form optical waveguides with good reproducibility by implanting proton to an LiNbO3 substrate prior to diffusion of an element for forming waveguides thereon. CONSTITUTION:Ti is vacuum-deposited at about 400Angstrom on an LiNbO3 substrate to form patterns. Proton is injected over the entire substrate. The diffusion 3 of Li2O the outside is suppressed by the presence of proton during the heat treamtmet for the purpose of diffusion of Ti. The substrate 1 is heat-treated for about 5hr at 960 deg.C, whereby Ti-diffused waveguides are formed. Thus the accurate controlling of element characteristics is made possible and the optical waveguides are formed with good reproduciblilty.
申请公布号 JPS58102203(A) 申请公布日期 1983.06.17
申请号 JP19810201248 申请日期 1981.12.14
申请人 FUJITSU KK 发明人 NAKAJIMA HIROKI;KIYONO MINORU;SAWAKI ITSUPEI
分类号 G02B6/13;G02B6/134;G02F1/313 主分类号 G02B6/13
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