发明名称 |
METHOD OF FORMING FERROMAGNETIC FILM |
摘要 |
PURPOSE:To remove magnetic anistropy and to obtain excellent magnetic characteristics by a method wherein a ferromagnetic film is produced in the rotating magnetic field through evaporation or sputtering. CONSTITUTION:A magnet 5 mounted to a yoke 4 directly coupled to a rotary shaft is rotated round a substrate holder 2 to apply the rotating magnetic field in parallel to the plane surface of a substrate 1. At the time of sputtering, after evacuating the interior of a vacuum container to 3X10<-7> Torr, As gas is introduced from an inlet port 6 to reach 2X10<-2> Torr. Pre-sputtering is first made for 30min and then main sputtering is performed on the glass substrate. The sputter film thus attained had a thickness of about 15mum. |
申请公布号 |
JPS58100411(A) |
申请公布日期 |
1983.06.15 |
申请号 |
JP19810198389 |
申请日期 |
1981.12.11 |
申请人 |
MATSUSHITA DENKI SANGYO KK |
发明人 |
SAKAKIMA HIROSHI;SATOMI MITSUO |
分类号 |
C23C14/14;G11B5/85;G11B5/851;H01F10/12;H01F10/13;H01F10/16;H01F41/14;H01F41/18 |
主分类号 |
C23C14/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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