| 摘要 |
PURPOSE:To improve the life of a thin film magnetic head and a sputtering target by providing a means for forming magnetic fields in the direction perpendicular to the plane of the target and making it possible to increase the speed of sputtering. CONSTITUTION:A magnetic field generating means such as, for example, an electromagnetic coil 14, which encloses a sputtering target 10 is provided in a vacuum chamber 6 near the side surface of the target 10. Electricity is conducted to the coil 14 to generate the magnetic fields (m) perpendicular to the plane of the target 10. Thereafter, a DC voltage E is applied between a counter electrode 12 and a target electrode 9 to deposit the thin film of a magnetic material on a substrate 13 to be treated. With such device, uniform magnetic fields are formed on the surface of the target, by which the consumption of the surface of the target is made uniform and the life of the target and the quality of the thin film are improved. |
