| 摘要 |
<p>PURPOSE:To perform inspection of patterns of an LSI and a mask efficiently by a method wherein pattern detections of both points are performed at the same time in relation to the same pattern, and both are compared mutually to perform the judgement of a defect. CONSTITUTION:Two incident lights A, B are irradiated to detection objective points 2A, 2B through half mirrors 3A, 7B and objectives 3, 7. A rotating polyhedral mirror 4 receives detected lights obtained through the objectives 3, 7, the half mirrors 3A, 7B, a prism 4A, and lenses 4B, 4C to reflect, and conducts to optical fibers 5, 8. A comparator 10a makes outputs of photomultipliers 6a, 9a being in mutually corresponding relation in relation to the detection objective points as input to compare magnitude of both, and outputs of the total comparators 10a, 10b,...10n are inputted to an OR gate 11. Scanning of the actual image is performed according to the rotation of the rotating polyhedral mirror 4, the same effect with the effect to be obtained by transferring the detection objective points 2A, 2B can be obtained, and comparative detection of every detection objective point of the pattern is performed.</p> |
