发明名称 METHOD AND DEVICE FOR CONTINUOUS VAPOR DEPOSITION
摘要 PURPOSE:To reduce the number of troubles occuring in ineffective vapor and to improve the operating efficiency of installations besides improvement in the yield of vapor depositing materials in the stage of continuous vapor deposition on a base material to be vapor deposited such as a steel strip, by making the continuously moving direction of the base material in a vacuum atmosphere longitudinal. CONSTITUTION:In an oxidizing or non-oxidizing furnace 3, the fats and oils stuck on the surfaces of a steel strip 1 are removed, and in a reducing furnace 4, the iron oxides of the surfaces are reduced; at the same time, the strip is annealed. Thereafter, the strip 1 is cooled in a cooling furnace 5 to the temp. necessary for vapor deposition and is admitted into a vapor deposition chamber 7 through a continuous sealer 6 for an inlet and a deflection roll 8 without exposure to the atmospheric air. The inside of the chamber 7 is maintained in a vacuum with a non-oxidative atmosphere, and the zinc vapor evaporated in an evaporating crucible 9 is changed of direction by a channel 15 and collides approximately at a right angle with the strip 1 passing longitudinally in the chamber, whereby a plating layer is formed on one side of the steel strip. Then the clearance C' between the strip 1 and the end of the crucible 9 is considerably diminished and the purpose is achieved.
申请公布号 JPS58100675(A) 申请公布日期 1983.06.15
申请号 JP19810198476 申请日期 1981.12.11
申请人 MITSUBISHI JUKOGYO KK 发明人 YANAGI KENICHI;TAGUCHI TOSHIO;ITANO SHIGEO;WADA TETSUYOSHI;FURUKAWA HEIZABUROU;WAKE KANJI
分类号 C23C14/56 主分类号 C23C14/56
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