| 摘要 |
PURPOSE:To reduce the manufacture cost of an image sensor by forming one of the photocurrent outputting electrodes in an ohmic contact and the other in non- ohmic contact, thereby simultaneously forming leakage current preventive diodes at the time of forming electrodes. CONSTITUTION:Metal or alloy to be formed in non-ohmic contact with an amorphous silicon is formed as a common electrode 22 on a glass substrate 21, and a gold layer 23 of a non-ohmic contact is formed as a photoconductive layer. Metal or alloy of ohmic contact with the silicon is formed as individual electrodes, and an insulating film 26 formed with upper wirings 29 in advance thereon is fusion-bonded. |
