| 摘要 |
PURPOSE:To manufacture an optical filter for correcting an illuminance distribution of an illumination optical system of a projection type exposure device of a semiconductor, etc., by applying a negative resist on a transparent substrate, and irradiating light from a light source. CONSTITUTION:On a transparent substrate 11, a negative resist 12 whose transmittance is low is applied, this substrate 11 is placed at a position where an optical filter 2 for correcting illuminance distribution is installed, and it is irradiated by light from a light source 1. When the substrate 11 is processed for development after the irradiation, a negative resist 12' whose shape corresponds to the illuminance distribution remains, and the optical filter 2 for correcting illuminance distribution is obtained. When it is installed at a position of said optical filter 2 once again, illumination light irradiated onto a reticle 4 becomes to have uniform illuminance. |
