发明名称 GROWING METHOD OF GAAS SINGLE CRYSTAL
摘要 PURPOSE:To increase the thickness of a sealing liquid layer and reduce the dislocation density of a GaAs crystal grown by the pulling up method with the high-pressure liquid seal, by monitoring the crystal growth with a quartz rod with one end inserted in the sealing liquid for a raw material melt. CONSTITUTION:In a growing method of a GaAs single crystal by the high-pressure liquid seal in which a raw material melt 5, e.g. GaAs melt, in a quartz crucible 4 is sealed up with a sealing liquid 6, e.g. B2O3 melt, placed on the raw material melt 5, the monitoring of the growth of GaAs single crystal 8 in pulling up is carried out by using a quartz rod 10 (held by a shaft 11 for moving the quartz rod 10) with one end inserted in the sealing liquid 6 on the raw material melt 5 in the quartz crucible 4 heated with a heating coil 2 and the other end in contact with a monitoring peep hole 9 provided at a pressure vessel 1 under a high internal pressure to increase the thickness of the sealing liquid 6 sufficiently, reduce the reduction in the temperature gradient by the enough heat insulation near the growing boundary surface of the crystal and grow the aimed crystal having a slight dislocation density.
申请公布号 JPS5895699(A) 申请公布日期 1983.06.07
申请号 JP19810194993 申请日期 1981.12.03
申请人 NIPPON DENKI KK 发明人 WATANABE HISAO;SHIRAKI KENICHI
分类号 C30B15/26;C30B27/02;C30B29/42;H01L21/208 主分类号 C30B15/26
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