发明名称 LIQUID-PHASE EPITAXIAL DEVICE
摘要 PURPOSE:To enable the stabilization of characteristics and the improvement in a yield, by providing a shelf in a waste liquid reservoir tank to facilitate and ensure the discharge of a waste solution, regarding the structure of a boat of a device for liquid-phase epitaxial growing. CONSTITUTION:A shelf 11 is provided in a waste liquid tank 8. A melted liquid 12 is once interrupted by the shelf 11, and then flows slowly in the lateral direction X along the shelf and falls down into the waste liquid tank in such a manner that it overflows from the edge of the shelf. A space 13 between the lower surface of the tank for growing and the shelf 11 is held at a prescribed distance (d). This means that the above interruption of the melted liquid 12 can be prevented so as to enable the smooth discharge of the waste liquid, by setting the product SXd of the bottom area S of the shelf 11 and the distance (d) to be smaller than the total volume Vo of the melted liquid 12 located between substrate supporting bodies.
申请公布号 JPS5895822(A) 申请公布日期 1983.06.07
申请号 JP19810194060 申请日期 1981.12.02
申请人 MATSUSHITA DENKI SANGYO KK 发明人 FURUIKE SUSUMU;MATSUDA TOSHIO
分类号 H01L21/205;H01L21/208;(IPC1-7):01L21/208 主分类号 H01L21/205
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