| 摘要 |
PURPOSE:To prevent the occurrence of chemical fog without interfering with positioning by a method wherein a transfer member composed of oxidized iron is arranged between a workpiece and a photoresist film to make the member adsorb light. CONSTITUTION:After an aluminum film 302 is formed on a silicon substrate 301 with a rugged surface is formed, photoresist 303 is formed through the rotary application method. Subsequently, an oxidized iron film 304 is formed and moreover photoresist 305 is formed. Then the photoresist 305 is exposed to light to form a pattern and developed to form a photoresist pattern 306. The film 304 is etched with the pattern 306 as a mask. Subsequently, the film 303 is etched with the oxidized iron film pattern 307 as a mask and the film 302 is etched with the pattern 303 as a mask to form an aluminum pattern 309. As a result, a pattern can be formed with high resolution, irrespective of the existence of the reflective aluminium film. |
