| 摘要 |
PURPOSE:To improve sensitivity and dry etching resistance by using a copolymer of methyl methacrylate and oxime methacrylate having acyl oxyimino groups and having 10,000-800,000 number average mol.wt. CONSTITUTION:A copolymer of 70-99mol% methyl methacrylate and 1- 30mol% oxime methacrylate having acyl oxyimino groups is used as resist acting in positive type to radiations such as far ultraviolet rays, electron rays, X- rays gamma-rays and alpha-rays, and the number average mol.wt. of the copolymer is made 10,000-800,000, whereby the resist having high sensitivity, high resolution and heat resistance and excellent dry etching resistance is obtained. Said copolymer is obtained by block polymn. using a, a'-azobisisobutyronitrile as an initiator. |
