发明名称 ELECTRON BEAM IRRADIATION APPARATUS
摘要 In order to reduce changes in magnetic effect on the electron beam due to movement of a platform on which a workpiece is mounted for irradiation, an electron beam irradiation apparatus comprises a base plate (9) of a magnetically permeable material on which the movable platform (4) is mounted. An upper magnetic shield plate (1) having an electron beam passage hole (3) is disposed between the platform and the electron beam source. Side members (2) of high permeability magnetically interconnect the base plate and the shield plate, and a magnetic shield cover plate (11) covers the table surface of the platform.
申请公布号 DE3062881(D1) 申请公布日期 1983.06.01
申请号 DE19803062881 申请日期 1980.06.04
申请人 FUJITSU LIMITED 发明人 IIJIMA, NOBUO
分类号 H01J37/04;G01Q30/02;G01Q30/16;G01Q30/18;H01J37/09;H01L21/027;H01L21/30;(IPC1-7):H01J37/09;H01J37/26;H01J37/30 主分类号 H01J37/04
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