| 摘要 |
PURPOSE:To increase washing effect and to reduce a floor area by a method wherein a vertical washing processing tank which successively moves wafers inserted from the upper part into a low-layer processing tank under its own weight is provided. CONSTITUTION:A washing processing tank 1 is vertically positioned and a basket 8, a belt conveyor 9, and a handling mechanism 10 are positioned at the upper part of the tank 1. A handling mechanism 10a, an air track 12, and a basket 13 are positioned at the lower part of the tank 1. To move a wafer 20 completed washing in an upper-layer processing tank 2a into a low-layer processing tank 2b, a washing solution in the upper-layer processing tank 2a is previously drawn out under the condition that the valve rod 26 of a gate valve is open, and the low-layer processing tank 2b is simultaneously filled with a washing solution. Then, when the valve rod 26 is open, the wafer 20 passes through a through hole 25 by tare weight and slowly moves to the low-layer processing tank 26. |
