Method for the development of photoresist layers, and developer.

摘要

A developer comprising a surfactant, an organic solvent, an alkali agent of about 0.01 to 5 wt% of a watersoftening agent having a sequestering ratio of at least 50% at the pH of the developer and water to remove the unexposed area of said photosensitive layer, and a method of development comprising imagewise exposing a photosensitive material comprising a support having thereon a light-hardenable photosensitive layer including an organic high-molecular polymer with an acid value of 10 to 200, and processing the photosensitive material with the developer.