ARTICLE COMPRISING A NEGATIVE X-RAY RESIST CONTAINING POLY(2,3-DICHLORO-1-PROPYL ACRYLATE) AND POLY(GLYCIDYL METHACRYLATE-CO-ETHYL ACRYLATE) AND METHOD USING THIS RESIST

摘要

This invention relates to negative x-ray resists useful in the production of high-resolution patterned images. The x-ray resist contains a mixture of poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate), with the latter forming between 1 percent and 20 percent by weight, of the total polymer mixture. This ray resist has adhesive and resolving properties superior to those of poly(2,3-dichloro-1-propyl acrylate). Superior properties of the mixture are attributed to the fact that the two polymers form a compatible polymer mixture which is a relatively rare and unpredictable event in polymer chemistry.