发明名称 FORMATION OF THIN FILM
摘要 PURPOSE:To securely set the constituent amount of a thin film to a desired value, in forming the thin film, by controlling the flow amount of a modifying gas to be introduced into a container independent of the internal pressure of the container. CONSTITUTION:In forming a thin film of amorphous silicon, a discharge tube 13 for carrying out the activation or the ionization of a modifying gas such as hydrogen and a flow control apparatus 14 for controlling the supply amount of the modifying gas are assembled in a modifying gas introducing pipe 12 connected to a ball jar 1. By this construction, because the amount of an activated or an ionized gas introduced into the bell jar 1 is kept constant always independent of the internal pressure therein, a constituent amount deposited on a base plate 3 can be stabilized.
申请公布号 JPS5888029(A) 申请公布日期 1983.05.26
申请号 JP19810184663 申请日期 1981.11.18
申请人 KONISHIROKU SHASHIN KOGYO KK 发明人 SHINDOU MASANARI;OOTA TATSUO;SATOU SHIGERU;MIYOUKAN ISAO;SHIMA TETSUO
分类号 C23C14/06;B01J19/00;C23C14/00;C23C14/08;H01L21/203 主分类号 C23C14/06
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