发明名称 ROTATINGLY DRYING DEVICE FOR WAFER
摘要 PURPOSE:To prevent misconception of a lot, and to enable to perform first-in first-out system of the wafers by a method wherein detected parts are provided respectively at the positions corresponding to carrier mounting parts, while a detected part for positioning is provided at another part, and they are detected to control rotation and stopping. CONSTITUTION:A disk 5 provided concentrically with a turntable 1 has light slits 6a-6d as the detected parts at the positons corresponding to the carrier mounting parts 2a-2d on the circumference thereof, and one slit out of the slits, the slit 6b for example, is made as the reference detected part (the reference light slit). Detecting means 8a, 8b of two groups are consisting of light emitters 9a, 9b and photo detectors 10a, 10b. A carrier 12a in the previous process is grasped by a carrier transferring device 11, and carriers 12b-12d are equipped on the carrier mounting parts 2b-2d. The turntable 1 is rotated in a high speed, and after the semiconductor wafers are dried, the rotation of the turntable 1 is stopped at the position where the photo detector 10a has detected the reference light slit 6b.
申请公布号 JPS5887827(A) 申请公布日期 1983.05.25
申请号 JP19810185254 申请日期 1981.11.20
申请人 TOKYO SHIBAURA DENKI KK 发明人 SHIBASAKA MITSUSADA;YOSHIKAWA KIYOSHI
分类号 H01L21/304;H01L21/00;(IPC1-7):01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址
您可能感兴趣的专利