发明名称 ION-BEAM IMPLANTATION DEVICE
摘要 PURPOSE:To obtain an ion-beam implantation device, which can perform automatic correction by easily carrying out oscillation of an ion source, by providing a computing element which obtains the vertical and the horizontal shifts of the gravitational center of an ion beam so as to measure the shifts of the gravitational center of the ion beam. CONSTITUTION:The current output values I1-I9 of Faraday cups group 6 are input into a computing element 7. Next, the computing element 7 obtains the vertical and the horizontal shifts from the central position of the gravitational centers of an ion beam 2 on an exposure surface 5, and thus obtained value is fed back to rotary electric motors 8 and 9. Then, the motors 8 and 9 oscillate an ion source 1 through drive-shaft switching mechanisms 10 and 11 so as to correct the axis of the ion beam 2. Owing to the above constitution, since the surface 5 is provided with the plural Faraday cups 6, and the oscillating mechanisms 8, 9, 10 and 11 are controlled by feeding back the gravitational shift of the beam 2 to the ion source 1, the ion source almost doesn't require its installation accuracy. In addition, control of the axis of the beam 2 can be remarkably easily carried out during the exchange of the ion source 1.
申请公布号 JPS5887748(A) 申请公布日期 1983.05.25
申请号 JP19820189064 申请日期 1982.10.29
申请人 HITACHI SEISAKUSHO KK 发明人 KAMESHIMA SHIGEHIRO;SAKUMICHI KUNIYUKI;YAMADA SEIICHI;SHIRAHAMA HIROSHI
分类号 H01J37/04;H01J37/304;H01J37/317;H01L21/265 主分类号 H01J37/04
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