发明名称 METHOD AND APPARATUS FOR ADJUSTING VAPOR-DEPOSITION FREQUENCY FOR PIEZOELECTRIC OSCILLATOR
摘要 PURPOSE:To utilize vapor-deposited metal effectively, by providing a plurality of piezoelectric oscillating bars in the vapor-deposition region of metallic vapor, interrupting only the metallic vapor of the oscillation bars when the preceding oscillation bars enter the set frequency, opening the oscillation circuit and interrupting the metallic vapor of the succeeding oscillation bars. CONSTITUTION:For a plurality of bars 12a-12c in the vapor-deposition region of metallic vapor throttled with openings 14, 15 provided for a mask 13, the preceding bar 12a is arranged to the region of the opening 14 and the succeeding bars 12b, 12c are arranged in the region of the opening 15 of metallic vapor 11. When the preceding bar 12a enters the set frequency, a control circuit is activated with detection circuits 17a-17c, a shielding plate 19a interrupts the metallic vapor for the bar 12a, opens an oscillation circuit 16a, and the metallic vapor of the succeeding bars 12b, 12c is shut with a shielding plate 19b to proceed the process for one bar's share (one pitch).
申请公布号 JPS5887907(A) 申请公布日期 1983.05.25
申请号 JP19810185845 申请日期 1981.11.19
申请人 MATSUSHIMA KOGYO KK 发明人 KARAKI YOSHIAKI;KURATA HEIJI
分类号 H03H3/04;(IPC1-7):03H3/04 主分类号 H03H3/04
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