发明名称 STRUCTURAL BODY OF SPUTTERING TARGET OF PLANAR MAGNETRON TYPE
摘要 PURPOSE:To provide a titled structural body which permits the prolongation of the life of a flat plate which is a target material and the formation of uniformly thin films by providing plural annular magnetic polar bodies and coils for excitation on the rear side of said flat plate. CONSTITUTION:Plural annular magnetic polar bodies 21-30 of mutually different radii and plural coils 21a-29a for exciting the same are provided on the rear side of a flat plate 31 which is a target material connected to a cathode 33. The bodies 21-30 are coupled magnetically by means of a yoke 32 and plural annular closed magnetic fields by lines 41a, 41b of magnetic fluxes are formed on the front side of the flat plate 31. When if sputtering is performed by applying voltage between the cathode 33 and the anode 37, uniformly eroded areas 38 are formed. The thin film of a uniform film thickness is formed over the entire part on a substrate of a large area by controlling the respective exciting currents of the coils for excitation and regulating the distributions of the magnetic fields.
申请公布号 JPS5887270(A) 申请公布日期 1983.05.25
申请号 JP19810183811 申请日期 1981.11.18
申请人 HITACHI SEISAKUSHO KK 发明人 ABE KATSUO;KOBAYASHI SHIGERU;KAMEI TSUNEAKI
分类号 C23C14/36;C23C14/35;H01J37/34;H01L21/285;H01L21/31 主分类号 C23C14/36
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