发明名称 Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and polyquinazoline dione precursor stages and the manufacture
摘要 The present invention relates to oligomeric and/or polymeric radiation-reactive precursor stages of polyimides, polyisoindoloquinazoline diones, polyoxazine diones and polyquinazoline diones as well as to a method for the preparation of these radiation-reactive precursor stages. The invention provides addition products of olefinically unsaturated monoepoxides on carboxyl group-containing polyaddition products of aromatic and/or heterocyclic tetracarboxylic-acid dianhydrides and diamino compounds or diamino compounds with at least one ortho-position amido group, or on carboxyl group-containing polyaddition products of aromatic and/or heterocyclic dihdyroxy dicarboxylic acids or corresponding diaminodicarboxylic acids and diisocyanates. The radiation-reactive precursor stages according to the invention are suitable, for example, for the manufacture of highly heat-resistant relief structures.
申请公布号 US4385165(A) 申请公布日期 1983.05.24
申请号 US19800179453 申请日期 1980.08.19
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 AHNE, HELLMUT;KUEHN, EBERHARD;RUBNER, ROLAND
分类号 C08F299/00;C08F290/00;C08G73/00;C08G73/06;C08G73/10;C08J3/24;C08L79/04;G02B1/10;G03F7/038;(IPC1-7):C08G18/30 主分类号 C08F299/00
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