发明名称 |
Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and polyquinazoline dione precursor stages and the manufacture |
摘要 |
The present invention relates to oligomeric and/or polymeric radiation-reactive precursor stages of polyimides, polyisoindoloquinazoline diones, polyoxazine diones and polyquinazoline diones as well as to a method for the preparation of these radiation-reactive precursor stages. The invention provides addition products of olefinically unsaturated monoepoxides on carboxyl group-containing polyaddition products of aromatic and/or heterocyclic tetracarboxylic-acid dianhydrides and diamino compounds or diamino compounds with at least one ortho-position amido group, or on carboxyl group-containing polyaddition products of aromatic and/or heterocyclic dihdyroxy dicarboxylic acids or corresponding diaminodicarboxylic acids and diisocyanates. The radiation-reactive precursor stages according to the invention are suitable, for example, for the manufacture of highly heat-resistant relief structures.
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申请公布号 |
US4385165(A) |
申请公布日期 |
1983.05.24 |
申请号 |
US19800179453 |
申请日期 |
1980.08.19 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
AHNE, HELLMUT;KUEHN, EBERHARD;RUBNER, ROLAND |
分类号 |
C08F299/00;C08F290/00;C08G73/00;C08G73/06;C08G73/10;C08J3/24;C08L79/04;G02B1/10;G03F7/038;(IPC1-7):C08G18/30 |
主分类号 |
C08F299/00 |
代理机构 |
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代理人 |
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地址 |
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