| 摘要 |
PURPOSE:To position an object efficiently with a high precision, by making a slit-shaped scanning beam parallel to alignment marks. CONSTITUTION:Linear and slit-shaped alignment marks 34-37, 38 and 39 formed in prescribed positions of two objects such as a semiconductor mask 3 and a wafer 1 are scanned with a linear or slit-shaped scanning beam at a prescribed angle to this scanning line along this scanning line. Mutual positional relations between alignment marks 34-37, 38, and 39 of the semiconductor mask 3 and the wafer 1 are read, and one object is moved relatively to the other at least to match both objects 3 and 1 to a prescribed positional relation. |
