| 摘要 |
PURPOSE:To stabilize a positive type photoresist developing soln. against CO2 in the air and to prevent its development performance from changing, by adding water-soluble amine, water-soluble ether, and water-soluble lactam to said developing soln. for a positive type photoresist using o-quinonediazide as a photosensitive agent. CONSTITUTION:A developing soln. is composed of 10-20vol% water-soluble amine, such as ethylenediamine or ethanolamine, 3-15vol% water-soluble ether, such as dioxane or diethylene glycol diethyl ether, 5-20 water-soluble lactam, such as N-methyl-2-pyrrolidone or dimethylimidazolidinone, and 50-70vol% water. This developing soln. is used for a positive type photoresist using o- quinonediazide as a photosensitive agent, permitting a superior image to be obtained in a short time, a defect of long developing time due to absorption of CO2 from the open air to be prevented, and consequently, this soln. to be suitable for forming a micropattern. |
