| 摘要 |
PURPOSE:To assuredly flaten an insulated layer stacked on a coil, by etching said insulated layer with use of the pattern of a polymer resin layer as a mask. CONSTITUTION:An SiO2 layer 8 is formed on a substrate 7, and the 2nd magnetic pole 4 of ''Permalloy '' is formed on the layer 8. Then a gap layer of SiO2 is formed, and Al serving as a coil is vapor-deposited on the gap layer. Thus a coil 6 is formed by a photoetching process. Then an insulated layer 9 of SiO2 is formed in a thickness larger than the Al layer, and furthermore the fluid and thermosetting polymer resin such as the polyimide resin 10 is spin-coated on the Al layer. The flatened resin layer 10 is etched to expose the projected part of the layer 9. Then the layer 10 is used as a mask to etch the projected part down to the same level of a depressed part of the layer 9. The mask is removed to flaten the layer 9. Then ''Permally '' is vapor-deposited to form the 1st magnetic pole 3. In such a way, a thin film magnetic head is obtained. |
