发明名称 SEMICONDUCTOR DEVICE CUTTING METHOD
摘要 A semiconductor device cutting method comprises a straight dicing process and a bevel dicing process. The straight dicing process is that a part of a semiconductor wafer, which does not have an effect for a semiconductor property, is cut perpendicularly. The bevel dicing process is that a part of semiconductor wafer, which has an effect for the semiconductor property, is cut to a bevel.
申请公布号 KR830000961(A) 申请公布日期 1983.05.14
申请号 KR19800001187 申请日期 1980.03.21
申请人 NIPPON ELECTRIC CO.,LTD. 发明人 SESUO HIRAOKA
分类号 H01L21/78;(IPC1-7):H01L21/78 主分类号 H01L21/78
代理机构 代理人
主权项
地址