MANUFACTURE OF THIN CARBIDE FILM

摘要

PURPOSE:To form a thin carbide film contg. little impurities on the surface of a substrate to be converted to a carbide by irradiating pulse laser light on the surface of the substrate having a thin carbon film deposited thereon to cause a carbide forming reaction. CONSTITUTION:Carbon 5 is deposited on a substrate 4 to be converted to carbide in about 0.1-100mum thickness by vacuum deposition or other method. This substrate 4 is mounted on a support 3 and pulse laser light is irradiated on the surface at about 10nsec pulse width. By the irradiation the temp. of the carbon film 5 on the surface of the substrate 4 and the temp. of the substrate 4 rise, and the carbon 5 and the substrate 4 are melted and reacted to form the carbide of the substrate 4 on the surface of the substrate 4. By this method the carbide forming reaction is finished in a short time and a high-quality thin carbide film contg. little impurities can be formed.