发明名称 Waessriges,saures,galvanisches Kupferbad
摘要 Copper plating baths include a poly-ether compound containing at least 3 and preferably 6 ether groups and no aliphatic chain exceeding 6 C atoms together with an organic sulphide group which may be linked to an -SO3H group. Alternatively the polyether and the S-compound may be added as separate compounds. The polyethers include polymers of 1:3 dioxolane as described in Specification 1,020,168, preferably of mol. wt. about 5000. They may contain the group (-C2H4OC2H4O-)x where x is 3 or more, or (-C3H6OC3H6O-)y where y is 3 to 10. The S-compounds include thiols, phenyl disulphides, and have present halogen, alkoxy, and other groups. Phenazine dyes may also be added. The copper salt may be sulphate, fluoborate, or a copper alkyl sulphonate or di-sulphonate. The poly-ethers having a terminal OH group form compounds with alcohols, chlorhydrin, nitriles, sulphonic acids, amides, alkanolamines and other compounds. The S-compound when added as a separate compound, preferably has a sulphonic group which may be used as a salt e.g. of triethanolamine, guanidine, ethylene diamine, or pyridine. A range of examples of poly-ethers and S-compounds are given with graphic formulae. In plating iron and steel, a preliminary flash coat of Cu or Ni is desirable. Preferably phosphorized copper anodes are used in the main plating process.
申请公布号 DE1521062(A1) 申请公布日期 1969.08.14
申请号 DE19631521062 申请日期 1963.04.16
申请人 THE UDYLITE RESEARCH CORP. 发明人 CREUTZ,HANS-GERHARD;M. STEVENSON,RICHARD;A. ROMANOWSKI,EDWARD
分类号 C25D3/38 主分类号 C25D3/38
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