PATTERN DATA PROCESSOR FOR ELECTRON BEAM EXPOSURE DEVICE,申请号JP19820173382-传众专利搜索

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法人/股东/高管

发明名称	PATTERN DATA PROCESSOR FOR ELECTRON BEAM EXPOSURE DEVICE
摘要
申请公布号	JPS5871625(A)	申请公布日期	1983.04.28
申请号	JP19820173382	申请日期	1982.10.04
申请人	VARIAN ASSOC	发明人	DONARUDO DABURIYU BERIAN;BIRII DABURIYU WAADO
分类号	H01L21/30;H01J37/302	主分类号	H01L21/30
代理机构		代理人
主权项
地址

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