| 摘要 |
<p>A method and apparatus for the heat-treatment, such as vapour deposition, of semiconductor wafers is disclosed, wherein a holder (1) loaded with wafers (5) is moved in vertical direction through a heating zone (12) without touching the wall thereof. The holder or boat may be a trough cage formed of end pieces and connecting rods of quartz and can be suspended on one end at a suspension device (21,22) of a lifting and lowering means (19,20), which may be combined with a cover (15) for the tubular heating zone. Deposition of particles from the wall of the heating zone on the wafers is thereby advantageously avoided.</p> |
