THIN FILM FORMATING DEVICE

摘要

PURPOSE:To control to permit the mixture of a modified element with high degree of freedom by a method wherein an evaporation source is provided in a vacuum tank and gas discharge tubes having different discharge systems are connected to the vacuum tank respectively. CONSTITUTION:A vacuum pump (a) is connected to a bell jar 1 through an exhaust path 3 having a butterfly valve 2 and a heater 5 heating an evaporated substrate 4 is provided and an evaporation source 7 is positioned to face to the substrate 4. The outlet is connected to the jar 1 and gas discharge tubes 8A and 8B are connected to the jar 1, for example. The tube 8A is of DC glow discharge system and the tube 8b is of microwave discharge system. Gas feeding tubes 12A, 12B branched and extended from a common modified element gas source 10 and inserting flow control valves 11A, 11B are connected to the gas inlets of these tubes 8A, 8B.