| 摘要 |
PURPOSE:To improve the efficiency of positioning work and to improve the yield and the quality of semiconductor elements, by forming target patterns for positioning between a mask and a mesh-aligning exposure device in a region other than a semiconductor element pattern on a photomask substrate with a metal (oxide). CONSTITUTION:On the surface of a transparent plane plate-shaped substrate 1 consisting of soda glass or quartz, target patterns 3 and 3' for positioning of a mesh-aligning exposure device are formed in a region other than the region of a semiconductor element pattern 2 with a metal or a metallic oxide. Patterns 3 and 3' are used to position said exposure device, and thus, the positioning precision is improved; and further, a mechanism which detects target patterns 3 and 3' to control the position automatically is attached to said exposure device to mount the photomask 1 automatically. Thus, the efficiency of positioning work is improved to improve the yield and the quality of a semiconductor device. |
