| 摘要 |
An electron-optical arrangement for generating high-current probes for electron-beam metrology is intended to be suitable for generating fine, high-intensity electron probes. According to the invention, an electron-optical arrangement for generating high-current probes for electron-beam metrology has single-stage probe forming. In an electron-optical arrangement according to the invention, all the intermediate images of the crossover are omitted, as a result of which the Boersch effect is minimised. Furthermore, the axial colour error is extremely small when using an imaging lens (AL) having a short focussing width. <IMAGE>
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