发明名称 |
Method of producing a light-duty contact |
摘要 |
A 6 to 14 mu m thick molybdenum layer, a 0.1 to 1 mu m thick palladium layer are deposited in sequence on a soft-magnetic contact carrier, followed by the electrodeposition of a 0.5 to 2 mu m thick gold or silver layer. The magnetic soft annealing has hitherto been carried out after applying the second layer. Soft annealing after applying the third layer prevents non-break faults as a consequence of adhesion with the mating contact part or of filament formation in the upper layer.
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申请公布号 |
DE3138759(A1) |
申请公布日期 |
1983.04.14 |
申请号 |
DE19813138759 |
申请日期 |
1981.09.29 |
申请人 |
SIEMENS AG |
发明人 |
HAMPP,EGON;HUBER,CHRISTIAN,DIPL.-PHYS.;MOSER,RICHARD;SCHOEN,ADOLF,DIPL.-ING.;KONERDING,HANS-HENNING;TONKA,WILLIBALD |
分类号 |
H01H1/02;(IPC1-7):H01H1/02 |
主分类号 |
H01H1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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