发明名称 COMPOSITE INSULATING FILM AND ETCHING METHOD THEREFOR
摘要 PURPOSE:To avoid disconnection, by superposing an inorganic insulating film having a window wherein the aperture is included inside on a high polymer resin film with the aperture on a substrate. CONSTITUTION:On the inorganic insulating film 13 of the high polymer resin film 12 on the substrate, a resist mask 14 with the aperture slightly larger than the fixed dimension is applied and etched resulting in window opening 15'. Next, the resist mask 14' having a window with the fixed dimension inside the window 15' is provided, and the high polymer resin film 12 is etched resulting in the aperture 15''. The mask 14' is removed, and a metallic electrode 16 is evaporated. In this constitution, overhang does not generate, and accordingly a wiring structural body without disconnections can be obtained.
申请公布号 JPS5861648(A) 申请公布日期 1983.04.12
申请号 JP19810160197 申请日期 1981.10.09
申请人 HITACHI SEISAKUSHO KK 发明人 SAIKI ATSUSHI;NISHIDA TAKASHI
分类号 H05K3/00;H01L21/306;H01L21/31;H01L21/768;H01L23/522;H05K3/06 主分类号 H05K3/00
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