| 摘要 |
<p>The appts. includes an electron gun producing an electron beam along an axis (D). The beam has a min. cross-section in a first plane of convergence; and an electronic lens is used to produce a magnified image of the beam cross-section in a second plant (P'o). A sensor collects part of the beam passing through plane (P'o); and an electronic deflector is used to displace image along two coordinate axes (X,Y) aligned at 90 deg. w.r.t. axis (D). A sweep generator provides signals to two coils in the electronic deflector, and is connected to an oscilloscope together with the sensor, so that a visual image is continuously obtd. which represents image. Appts. is used in electron microscopy, or in microlithography used in mfg. semiconductor devices.</p> |
