发明名称 Phogographic treatment of uneven surfaces
摘要 Production of semiconductor circuits such as flip flop arrangements, where stencil cannot be contacted with light-sensitive material in later production stages, is carried out by exposing and developing positive coating in areas where raised parts are to be fixed, then exposing to different pattern and using sensitive coating as plating protection agent during production of raised parts; latent image is then developed so that only those regions remain where metal electrodes are to be formed.
申请公布号 DE1915919(A1) 申请公布日期 1970.10.01
申请号 DE19691915919 申请日期 1969.03.28
申请人 SONY CORP. 发明人 AKIYAMA,KATSUHIKO
分类号 H01L21/00;H01L23/29;H01L23/485 主分类号 H01L21/00
代理机构 代理人
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