| 摘要 |
PURPOSE:To execute stages from inspection up to correction with one system by comparing and collating the 1st scanning signal formed in accordance with design data and the 2nd scanning signal obtained by scanning the pattern to be inspected optically and obtaining information on defects. CONSTITUTION:A photomask formed with the pattern to be inspected is placed on a sample stand 5, and light is irradiated from a light source 8 thereto. The light transmitted through the mask is imaged on a signal detecting part 10 via a half mirror and the pattern to be inspected is recognized by an optical scanning part 11. On the other hand, the design data of the photomask which is converted to a scanning signal is fed from a generating part 12 for a reference pattern to a data comparing part 13, where said signal is compared and collated with the pattern data from the part 11, and the presence or absence of any defective pattern part on the photomask is decided. If any remaining defective pattern part exists, a laser control part 15 is controlled to focus and irradiate the laser pulses to the remaining defective pattern part of the photomask, whereby the defective pattern part is removed. |
